GB/T 44928-2024 Active National standards

GB/T 44928-2024 Terms of microlithography technology for microelectronics

GB/T 44928-2024 Terms of microlithography technology for microelectronics

Publish Date: 2024-12-31 Implement Date: 2024-12-31 For services related to genuine standard inquiry, procurement, translation, and other related services in China, please Contact Us

Basic Information

Standard Code: GB/T 44928-2024
Standard Type: National standards
Standard Status: Active
is_force_gb: no
CCS Name: Electronic devices and specialized materials, parts, and structural components
ICS Name: Special materials for electronic technology
Publish Date: 2024-12-31
Implement Date: 2024-12-31
Pages: 192 pages

Scope

This document defines terms and definitions related to microelectronics lithography technology, including advanced lithography technology, micro-lithography patterning and graphics data processing technology, micro-lithography photosensitive materials, chrome plates and substrate materials, photomask technology, lithography process (exposure, etching, and micro-nano processing) technology, electron beam mask manufacturing and direct writing technology, lithography and mask quality parameter measurement and evaluation, mask manufacturing equipment, and micro-lithography equipment.
This document is applicable to teaching, scientific research, production, application, trade, and technical exchanges in the field of microelectronics lithography technology.

Development Information

Word Count: 351 Thousand words Pages: 192 pages

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