DB53/T 501-2013 Abolished Yunnan ProvinceLocal standards

DB53/T 501-2013 Determination of impurity elements in trichlorosilane for polycrystalline silicon by inductively coupled plasma mass spectrometry

DB53/T 501-2013 Determination of impurity elements in trichlorosilane for polycrystalline silicon by inductively coupled plasma mass spectrometry

Publish Date: 2013-08-01 Implement Date: 2013-10-01 For services related to genuine standard inquiry, procurement, translation, and other related services in China, please Contact Us
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Basic Information

Standard Code: DB53/T 501-2013
Standard Type: Local standards
Standard Status: Abolished
is_force_gb: no
CCS Name: Inorganic chemical raw materials
ICS Name: Chemical analysis
Publish Date: 2013-08-01
Implement Date: 2013-10-01

Scope

This standard specifies the method for determining the content of impurity elements such as boron, iron, aluminum, calcium, copper, chromium, nickel, antimony, cobalt, zinc, tin, titanium, and manganese in trichlorosilane used for polysilicon production by inductively coupled plasma mass spectrometry. This standard is applicable to the determination of the content of impurity elements such as boron, iron, aluminum, calcium, copper, chromium, nickel, antimony, cobalt, zinc, tin, titanium, and manganese in trichlorosilane produced by the modified Siemens method for polysilicon production.

Development Information

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