GB/T 3143-1982
Active
DB53/T 501-2013
Abolished
Yunnan ProvinceLocal standards
DB53/T 501-2013 Determination of impurity elements in trichlorosilane for polycrystalline silicon by inductively coupled plasma mass spectrometry
DB53/T 501-2013 Determination of impurity elements in trichlorosilane for polycrystalline silicon by inductively coupled plasma mass spectrometry
Price:
$ 30
Basic Information
Standard Code:
DB53/T 501-2013
Standard Type:
Local standards
Standard Status:
Abolished
is_force_gb:
no
CCS Name:
Inorganic chemical raw materials
ICS Name:
Chemical analysis
Publish Date:
2013-08-01
Implement Date:
2013-10-01
Scope
This standard specifies the method for determining the content of impurity elements such as boron, iron, aluminum, calcium, copper, chromium, nickel, antimony, cobalt, zinc, tin, titanium, and manganese in trichlorosilane used for polysilicon production by inductively coupled plasma mass spectrometry. This standard is applicable to the determination of the content of impurity elements such as boron, iron, aluminum, calcium, copper, chromium, nickel, antimony, cobalt, zinc, tin, titanium, and manganese in trichlorosilane produced by the modified Siemens method for polysilicon production.
Development Information
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