GB/T 3143-1982
Active
GB/T 30701-2014
Active
National standards
GB/T 30701-2014 Surface chemical analysis—Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence(TXRF) spectroscopy
GB/T 30701-2014 Surface chemical analysis—Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence(TXRF) spectroscopy
Basic Information
Standard Code:
GB/T 30701-2014
Standard Type:
National standards
Standard Status:
Active
is_force_gb:
no
CCS Name:
Basic standards and general methods
ICS Name:
Chemical analysis
Publish Date:
2014-06-09
Implement Date:
2014-12-01
Pages:
20 pages
Scope
This standard specifies the chemical collection method (gas phase decomposition method or direct acidic droplet decomposition method) for iron and/or nickel on the surface of the silicon wafer working standard samples, and the determination by total reflection X-ray fluorescence spectrometry (TXRF).
Development Information
Referenced Standards
Adopt standards
ISO 17331:2004
Related Standards
GB/T 4472-1984
Replaced
GB/T 4472-1984 General rule for determination of density and relative density for chemical products
GB/T 4946-1985
Replaced
GB/T 4946-1985 Terms of gas chromatography
GB/T 5274-1985
Replaced
GB/T 5274-1985 Gas analysis—Preparation of calibration gas mixtures—Weighing methods
GB/T 5831-1986
Replaced
GB/T 5831-1986 Determination of trace oxygen in the gases—Colorimetric method
GB/T 5832.2-1986
Replaced