GB/T 1663-2001
Active
DB53/T 421-2012
Abolished
Yunnan ProvinceLocal standards
DB53/T 421-2012 Determination of Boron in Industrial Silicon by Inductively Coupled Plasma Atomic Emission Spectroscopy (ICP-AES)
DB53/T 421-2012 Determination of Boron in Industrial Silicon by Inductively Coupled Plasma Atomic Emission Spectroscopy (ICP-AES)
Price:
$ 30
Basic Information
Standard Code:
DB53/T 421-2012
Standard Type:
Local standards
Standard Status:
Abolished
is_force_gb:
no
CCS Name:
Basic standards and general methods
ICS Name:
Physicochemical analysis methods
Publish Date:
2012-09-20
Implement Date:
2012-12-01
Scope
This standard specifies the method of determining boron in industrial silicon using inductively coupled plasma emission spectrometry. This standard is applicable to the determination of boron in industrial silicon, with a detection range of 0.0004% to 0.017%.
Development Information
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