PDF
GB/T 13388-2009 Active
GB/T 13388-2009 Method for measuring crystallographic orientation of flats on single-crystal silicon slices and wafers by X-ray techniques
Abstract
2.1 This standard specifies the measurement method for the α angle, which is the angle between the crystal orientation perpendicular to the reference plane of the circular silicon wafer and the reference surface of the silicon wafer. 2.2 This standard applies to silicon wafers. The length of the reference surface of the silicon wafer shall comply with the provisions of GB/T 12964 and GB/T 12965, and the deviation of the silicon wafer angle shall be within the range of -5° to +5°.
General Product Information
| Document Type | National standards |
|---|---|
| Standard Status | Active |
| Standard Code | GB/T 13388-2009 |
| CCS | Semi-metals and semiconductor materials |
| ICS | Semiconductor materials |
| Implement Date | 2010-06-01 |
Price
$ 50
Subtotal
$ 50
Tax
$ 0.00
Order Total (incl. tax)
$ 50