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GB/T 24581-2009

GB/T 24581-2009 Test method for low temperature FT-IR analysis of single crystal silicon for Ⅲ-Ⅴ impurities

Available format(s)
PDF
Language(s)
Chinese
Publish Date
2009-10-30

Abstract

2.1 This standard is applicable to the detection of the content of electroactive elements boron (B), phosphorus (P), arsenic (As), aluminum (Al), antimony (Sb), and gallium (Ga) in silicon single crystals. 2.2 The concentration range of each electroactive element impurity or dopant in silicon covered by this standard is (0.01×10 -9 to 5.0×10 -9) a.

General Product Information

Document Type National standards
Standard Status Replaced
Standard Code GB/T 24581-2009
CCS Semi-metals and semiconductor materials
ICS Semiconductor materials
Implement Date 2010-06-01
Price $ 44
Subtotal $ 44
Tax $ 0.00
Order Total (incl. tax) $ 44

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