Technical Requirements for the Microwave Plasma Chemical Vapor Deposition System, T/CIET 1178-2025
T/CIET 1178-2025 Microwave plasma chemical vapor deposition system technical requirements
Basic Information
Scope
Scope: This document specifies the abbreviations, working principles, working environment and operating conditions, system structure, system characteristics, process systems and equipment, operation and maintenance, and test methods of microwave plasma chemical vapor deposition systems. This document is applicable to microwave plasma chemical vapor deposition systems; Main technical content: This document specifies the abbreviations, working principles, working environment and operating conditions, system structure, system characteristics, process systems and equipment, operation and maintenance, and test methods of microwave plasma chemical vapor deposition systems. This document is applicable to microwave plasma chemical vapor deposition systems.