T/JSQA 157-2023 Pad for Chemical Mechanical Polishing

Scope

Scope: This document specifies the terms and definitions, classification and naming, requirements, test methods, inspection rules, and marking, packaging, transportation, and storage of pads used in chemical mechanical polishing. This document applies to chemical mechanical polishing pads made from solvent-based polyurethane and N,N-dimethylformamide as raw materials, which are converted into hard and soft polishing layers by a non-solvent phase transformation method and then combined into a laminated structure. Main technical content: This standard specifies the terms and definitions, classification and naming, requirements, test methods, inspection rules, and marking, packaging, transportation, and storage of chemical mechanical polishing pads. The technical requirements stipulate the normal production, inspection, and use environmental conditions, appearance quality, and product performance. The appearance quality includes external contamination. Among them, the technical indicators of thickness and width deviation exceed the national standard GB/T 8949—2008 for polyurethane dry-process artificial leather, and the indicators of weight, density, compression rate, compression elasticity rate, hardness, and opening diameter fill the gaps in the national standard GB/T 8949—2008 for polyurethane dry-process artificial leather.

Development Information

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