T/CNIA 0120-2021 Determination of Trace Impurity Element Content in High-purity Nitric Acid for Electronic Industry Using Inductively Coupled Plasma Mass Spectroscopy
T/CNIA 0120-2021 Determination of Trace Impurity Element Content in High-purity Nitric Acid for Electronic Industry Using Inductively Coupled Plasma Mass Spectroscopy
Basic Information
Scope
Main technical content: This document specifies the method for determining the content of impurity elements (aluminum, antimony, arsenic, barium, boron, cadmium, calcium, chromium, copper, iron, lead, lithium, magnesium, manganese, nickel, potassium, sodium, tin, titanium, vanadium, and zinc) in high-purity nitric acid used in the electronics industry by inductively coupled plasma mass spectrometry. This document is applicable to the determination of trace impurity elements in high-purity nitric acid used in the electronics industry, with the measurement range for each element being 0.001μg/kg to 10.000μg/kg. The standard working curve method is suitable for impurity element content > 0.100μg/kg to 10.000μg/kg; the standard addition method is suitable for impurity element content ≤ 0.100μg/kg to 0.001μg/kg.