T/CEMIA 036-2023 High alkali concentration negative photoresist developer for semiconductor display
T/CEMIA 036-2023 High alkali concentration negative photoresist developer for semiconductor display
Basic Information
Scope
This document specifies the abbreviations, technical requirements, inspection methods, inspection rules, marking and packaging, transportation, storage, and safety matters for high-alkali concentration negative resist developing solutions used in semiconductor displays. This document applies to high-alkali concentration negative resist developing solutions composed of potassium hydroxide, surfactants, and water, with a mass percentage of potassium hydroxide greater than 8%. This high-alkali concentration negative resist developing solution is mainly used for developing negative photoresists in semiconductor manufacturing processes, as well as developing photoresists in thin-film transistor liquid crystal displays (TFT-LCDs) or organic light-emitting diode displays (OLEDs).