YS/T 935-2013 Active Industry standards-Non-ferrous metals

YS/T 935-2013 Standard guide for analysis and reporting the impurity content and grade of high purity metallic sputtering targets for electronic thin film applications

YS/T 935-2013 Standard guide for analysis and reporting the impurity content and grade of high purity metallic sputtering targets for electronic thin film applications

Publish Date: 2013-10-17 Implement Date: 2014-03-01 For services related to genuine standard inquiry, procurement, translation, and other related services in China, please Contact Us

Basic Information

Standard Code: YS/T 935-2013
Standard Type: Industry standards
Standard Status: Active
is_force_gb: no
CCS Name: Precious metals and their alloys
ICS Name: Other non-ferrous metal products
Publish Date: 2013-10-17
Implement Date: 2014-03-01
Pages: 5 pages

Scope

This standard specifies the definition method of purity grades for high-purity metal sputtering targets used in the preparation of electronic films, the analysis method of impurity content, sampling rules, and reporting standards for target purity grades, etc.
This standard applies to all types of high-purity metal sputtering targets used in electronic films (hereinafter referred to as targets). Other targets with higher purity requirements can also refer to and use the purity grade, impurity content analysis, and reporting standards specified in this standard.

Development Information

Word Count: 6 Thousand words Pages: 5 pages

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