T/CNIA 0118-2021 Active Group standards

T/CNIA 0118-2021 Determination of Trace Impurity Element Content in High-purity Hydrofluoric Acid for Electronic Industry Using Inductively Coupled Plasma Mass Spectroscopy (ICP-MS)

Publish Date: 2021-03-19 Implement Date: 2021-09-01 For services related to genuine standard inquiry, procurement, translation, and other related services in China, please Contact Us

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Basic Information

Standard Code: T/CNIA 0118-2021

Standard Type: Group standards

Standard Status: Active

is_force_gb: no

CCS Name: -

ICS Name: Chemical analysis

Publish Date: 2021-03-19

Implement Date: 2021-09-01

Scope

Main technical content: This document specifies a method for determining the content of impurity elements (aluminum, antimony, arsenic, barium, boron, cadmium, calcium, chromium, copper, iron, lead, lithium, magnesium, manganese, nickel, potassium, sodium, tin, titanium, vanadium, and zinc) in high-purity hydrofluoric acid used in the electronics industry by inductively coupled plasma mass spectrometry. This document is applicable to the determination of trace impurity elements in high-purity hydrofluoric acid used in the electronics industry, with a measurement range of 0.001μg/kg to 10.000μg/kg. The standard working curve method is suitable for determining the content of each trace impurity element exceeding 0.100μg/kg; the standard addition method is suitable for determining the content of each trace impurity element less than or equal to 0.100μg/kg.