GB/T 40110-2021 Active National standards

GB/T 40110-2021 Surface chemical analysis—Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy

Publish Date: 2021-05-21 Implement Date: 2021-12-01 For services related to genuine standard inquiry, procurement, translation, and other related services in China, please Contact Us

Basic Information

Standard Code: GB/T 40110-2021

Standard Type: National standards

Standard Status: Active

is_force_gb: no

CCS Name: Basic standards and general methods

ICS Name: Chemical analysis

Publish Date: 2021-05-21

Implement Date: 2021-12-01

Pages: 24 pages

Scope

This document describes the TXRF method for measuring the atomic surface density of elemental contamination on the surface of silicon wafers after chemical mechanical polishing or epitaxial growth.
This document is applicable to the following scenarios:
—— Elements with atomic numbers from 16 (S) to 92 (U);
—— Contaminating elements with atomic surface densities ranging from 1×1010 atoms/cm2 to 1×1014 atoms/cm2;
—— Contaminating elements with atomic surface densities ranging from 5×108 atoms/cm2 to 5×1012 atoms/cm2 obtained by the VPD (gas phase decomposition) sample preparation method (see 3.4).