T/CNGA 53-2023 General Requirements for Clothing Digital Pattern Management Platforms
T/CNGA 53-2023
Basic Information
Scope
Scope: This document provides the overall architecture, functional requirements, and other application requirements of the digital garment pattern management platform. This document is applicable to the planning, design, construction, and application of the digital garment pattern management platform, and can also serve as a reference for garment enterprises, IT consulting service units, system developers, and other personnel. Main technical content: 3. Terminology and definitions GB/T 15557 defines the following terms and definitions, which are applicable to this document: 3.1 Garment pattern Garment pattern refers to the three-dimensional shape of the entire garment, which is determined by factors such as the materials used in garment production, patterns, and processing techniques. It is also referred to as a pattern. 3.2 Digital garment pattern A digital garment pattern refers to garment pattern data stored in digital form. 3.3 Basic pattern A basic pattern refers to a basic type of garment pattern determined by an enterprise within a certain development cycle, which typically only includes basic structure lines. By modifying the basic pattern, specific design styles can be obtained. 3.4 Product pattern A product pattern refers to a garment pattern determined by an enterprise during the product development and production process, including historical patterns and patterns in development. 3.5 Parts pattern A parts pattern refers to a garment component pattern. It typically cannot form a garment style pattern alone and requires combining and modifying parts to form a specific style pattern. For example, collar, sleeve, and pocket patterns, which can be quickly transformed into specific style patterns with simple modifications in applications. 3.6 Pattern library A pattern library refers to a collection of technical materials such as basic patterns and product patterns formed by an enterprise during the R&D and production process.