GB/T 40279-2021 Active National standards

GB/T 40279-2021 Test method for thickness of films on silicon wafer surface—Optical reflection method

Publish Date: 2021-08-20 Implement Date: 2022-03-01 For services related to genuine standard inquiry, procurement, translation, and other related services in China, please Contact Us

Basic Information

Standard Code: GB/T 40279-2021

Standard Type: National standards

Standard Status: Active

is_force_gb: no

CCS Name: \nTest methods for the physical properties of metals

ICS Name: \nMetal material testing

Publish Date: 2021-08-20

Implement Date: 2022-03-01

Pages: 9 pages

Scope

This document specifies a method for testing the thickness of silicon dioxide films and polycrystalline silicon films on silicon wafers using optical reflection. This document is applicable to testing the thickness of silicon dioxide films and polycrystalline silicon films grown on silicon wafers, as well as all smooth, transparent or semi-transparent films with low absorption coefficients, such as amorphous silicon, silicon nitride, diamond-like coatings, photoresist, and other surface films. The test range is 15 nm to 105 nm.