T/CHBAS 42-2023 Active Group standards

T/CHBAS 42-2023 Phosphine gas mixture used in the electronics industry

T/CHBAS 42-2023 Phosphine gas mixture used in the electronics industry

Publish Date: 2023-12-22 Implement Date: 2023-12-30 For services related to genuine standard inquiry, procurement, translation, and other related services in China, please Contact Us
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Basic Information

Standard Code: T/CHBAS 42-2023
Standard Type: Group standards
Standard Status: Active
is_force_gb: no
CCS Name: -
ICS Name: Industrial gases
Publish Date: 2023-12-22
Implement Date: 2023-12-30

Scope

Main technical content: This document specifies the technical requirements, test methods, inspection rules, marking, packaging, transportation and storage, and safety of phosphine gas mixtures used in the electronics industry (hereinafter referred to as phosphine gas mixtures). This document is applicable to phosphine gas mixtures used in the electronics industry, which are mainly used as doping sources for epitaxy processes, diffusion sources for diffusion processes, and ion implantation sources. The balance gas in phosphine gas mixtures is usually helium, argon, nitrogen, and hydrogen, but it can also be other gases that do not chemically react with phosphine and do not affect the reaction process.

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