GB/T 46057-2025 Active National standards

GB/T 46057-2025 Microbeam analysis—Scanning electron microscopy—Method for evaluating critical dimensions by CD-SEM

Publish Date: 2025-08-29 Implement Date: 2026-03-01 For services related to genuine standard inquiry, procurement, translation, and other related services in China, please Contact Us

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Basic Information

Standard Code: GB/T 46057-2025

Standard Type: National standards

Standard Status: Active

is_force_gb: no

CCS Name: Basic standards and general methods

ICS Name: Chemical analysis

Publish Date: 2025-08-29

Implement Date: 2026-03-01

Pages: 52 pages

Scope

This document specifies the structural models, relevant parameters, file formats, and fitting procedures required for determining the critical dimension (CD) values of wafers and photomasks using length measurement scanning electron microscopy (CD-SEM) based on the Model Database (MBL) method.
This document is applicable to the measurement of line widths in samples, such as gate electrodes on wafers, photomasks, and patterns of single isolated or densely arranged line features, down to a minimum of 10 nm.