GB/T 14139-2009

This standard specifies the product classification, technical requirements, test methods, inspection rules, and marking, packaging, transportation, and storage of silicon epitaxial wafers. This standard applies to homogeneous silicon epitaxial wafers with an n-type epitaxial layer (N/N+) grown on an n-type polished silicon substrate and a p-type epitaxial layer (P/P+) grown on a p-type polished silicon substrate. The products are mainly used for the fabrication of silicon semiconductor devices. Other types of silicon epitaxial wafers can be used as reference.