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GB/T 40279-2021 Active
GB/T 40279-2021 Test method for thickness of films on silicon wafer surface—Optical reflection method
Abstract
This document specifies a method for testing the thickness of silicon dioxide films and polycrystalline silicon films on silicon wafers using optical reflection. This document is applicable to testing the thickness of silicon dioxide films and polycrystalline silicon films grown on silicon wafers, as well as all smooth, transparent or semi-transparent films with low absorption coefficients, such as amorphous silicon, silicon nitride, diamond-like coatings, photoresist, and other surface films. The test range is 15 nm to 105 nm.
General Product Information
| Document Type | National standards |
|---|---|
| Standard Status | Active |
| Standard Code | GB/T 40279-2021 |
| CCS | \nTest methods for the physical properties of metals |
| ICS | \nMetal material testing |
| Implement Date | 2022-03-01 |
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