GB/T 29658-2013 High-purity sputtering aluminium and aluminium alloy target used in electronic film

GJB 1580A JB/T 4734 GB/T 1804-2000 General tolerances for linear and angular dimensions without individual tolerance indications GB/T 6394-2002 Metal-methods for estimating the average grain size GB/T 6394-2017 Determination of estimating the average grain size of metal GB/T 14265-1993 General rule of chemical analysis for hydrogen, oxygen, nitrogen, carbon and sulfur in metal's materials GB/T 14265-2017 General rule of chemical analysis for hydrogen,oxygen, nitrogen, carbon and sulfur in metallic materials GB/T 15823-1995 Examination for helium leak detecting GB/T 15823-2009 Non-destructive testing—Test methods for helium leak testing GB/T 20975.25-2008 Methods for chemical analysis of aluminium and aluminium alloys—Part 25:Inductively coupled plasma atomic emission spectrometric method GB/T 20975.25-2020 Methods for chemical analysis of aluminium and aluminium alloys—Part 25:Determination of elements content—Inductively coupled plasma atomic emission spectrometric method YS/T 837-2012 Standard practice for ultrasonic C-scan bond evaluation of sputtering target-backing plate assemblies YS/T 871-2013 Chemical analysis of high purity aluminium—Determination of trace impurities—Glow discharge mass spectrometry YS/T 871-2023 Method for Chemical Analysis of Pure Aluminum: Determination of Trace Impurity Element Content - glow discharge mass spectrometry