YS/T 936-2013 Active Industry standards-Non-ferrous metals

YS/T 936-2013 Sputtering nickel vanadium alloy target used in integrated circuit device

YS/T 936-2013 Sputtering nickel vanadium alloy target used in integrated circuit device

Publish Date: 2013-10-17 Implement Date: 2014-03-01 For services related to genuine standard inquiry, procurement, translation, and other related services in China, please Contact Us

Basic Information

Standard Code: YS/T 936-2013

Standard Type: Industry standards

Standard Status: Active

is_force_gb: no

CCS Name: Heavy metals and their alloys

ICS Name: Nickel and chromium products

Publish Date: 2013-10-17

Implement Date: 2014-03-01

Pages: 15 pages

Scope

This standard specifies the requirements, test methods, inspection rules, and markings for nickel-vanadium alloy sputtering targets used in integrated circuit devices, as well as their packaging, transportation, storage, quality certificates, and the content of contracts or purchase orders.
This standard applies to all types of nickel-vanadium alloy sputtering targets used in electronic film manufacturing.

Development Information

Word Count: 28 Thousand words Pages: 15 pages

Referenced Standards

GJB 1580A GB/T 1031-1995 Surface roughness parameters and their values GB/T 1031-2009 Geometrical Product Specifications (GPS)—Surface texture:Profile method—Surface roughness parameters and their values GB/T 6394-2002 Metal-methods for estimating the average grain size GB/T 6394-2017 Determination of estimating the average grain size of metal GB/T 14265-1993 General rule of chemical analysis for hydrogen, oxygen, nitrogen, carbon and sulfur in metal's materials GB/T 14265-2017 General rule of chemical analysis for hydrogen,oxygen, nitrogen, carbon and sulfur in metallic materials YS/T 837-2012 Standard practice for ultrasonic C-scan bond evaluation of sputtering target-backing plate assemblies

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