T/CIET 1296-2025 High-Purity Tantalum Target Materials for Integrated Circuits
T/CIET 1296-2025 High-purity tantalum target for integrated circuits
Basic Information
Scope
Scope: This document specifies the technical requirements, test methods, inspection rules, as well as marking, packaging, transportation, and storage for high-purity tantalum targets used in integrated circuits. This document applies to high-purity tantalum targets used in the physical vapor deposition (PVD) process during the manufacturing of integrated circuits. Main technical content: This document specifies the technical requirements, test methods, inspection rules, as well as marking, packaging, transportation, and storage for high-purity tantalum targets used in integrated circuits. This document applies to high-purity tantalum targets used in the physical vapor deposition (PVD) process during the manufacturing of integrated circuits.