GB/T 25188-2010 Active National standards

GB/T 25188-2010 Thickness measurements for ultrathin silicon oxide layers on silicon wafers X-ray photoelectron spectroscopy

GB/T 25188-2010 Thickness measurements for ultrathin silicon oxide layers on silicon wafers X-ray photoelectron spectroscopy

Publish Date: 2010-09-26 Implement Date: 2011-08-01 For services related to genuine standard inquiry, procurement, translation, and other related services in China, please Contact Us

Basic Information

Standard Code: GB/T 25188-2010

Standard Type: National standards

Standard Status: Active

is_force_gb: no

CCS Name: Basic standards and general methods

ICS Name: Chemical analysis

Publish Date: 2010-09-26

Implement Date: 2011-08-01

Pages: 9 pages

Scope

This standard specifies a method for accurately measuring the thickness of the ultra-thin silicon oxide layer on the surface of silicon wafers, namely X-ray photoelectron spectroscopy (XPS). This standard is applicable to the accurate measurement of the thickness of the ultra-thin silicon oxide layer prepared on the surface of silicon wafers by thermal oxidation; typically, the silicon oxide layer thickness applicable to this standard is not greater than 6 nm.

Development Information

Word Count: 13 Thousand words Pages: 9 pages

Referenced Standards

GB/T 22461-2008 Surface chemical analysis—Vocabulary GB/T 22461.1-2023 Surface chemical analysis—Vocabulary—Part 1:General terms and terms used in spectroscopy GB/T 22461.2-2023 Surface chemical analysis—Vocabulary—Part 2:Terms used in scanning probe microscopy GB/T 19500-2004 General rules for X-ray photoelectron spectroscopic analysis method GB/T 21006-2007 Surface chemical analysis—X-ray photoelectron and Auger electron spectrometers—Linearity of intensity scale GB/T 22571-2008 Surface chemical analysis—X-ray photoelectron spectrometers—Calibration of energy scales GB/T 22571-2017 Surface chemical analysis—X-ray photoelectron spectrometers—Calibration of energy scales GB/T 22461.3-2026 Surface chemical analysis—Vocabulary—Part 3:Terms used in optical interface analysis GB/T 19500-2025 Surface chemical analysis—General rules for X-ray photoelectron spectroscopic analysis method

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