GB/T 29844-2013 Active National standards

GB/T 29844-2013 Specifications for metrology patterns for the evaluation of advanced photolithgraphy

Publish Date: 2013-11-12 Implement Date: 2014-04-15 For services related to genuine standard inquiry, procurement, translation, and other related services in China, please Contact Us

Basic Information

Standard Code: GB/T 29844-2013

Standard Type: National standards

Standard Status: Active

is_force_gb: no

CCS Name: Electronic devices and specialized materials, parts, and structural components

ICS Name: Special materials for electronic technology

Publish Date: 2013-11-12

Implement Date: 2014-04-15

Pages: 10 pages

Scope

This standard specifies the shape, general dimensions, and recommended layout and design rules of standard test pattern units used for comprehensive evaluation of advanced integrated circuit lithography processes. These standard test patterns include various pattern units suitable for optical microscopes and scanning electron microscopes.
This standard is applicable to the evaluation of the characteristics and capabilities of integrated circuits, conventional masks, photoresists, and lithography machines, as well as phase measurement of alternating phase-shifting masks. It is suitable for lithography equipment with wavelengths such as G-line, I-line, KrF, and ArF, and corresponding lithography processes.

Development Information

Word Count: 20 Thousand words Pages: 10 pages

Referenced Standards

GB/T 16878-1997 Specification for metrology pattern cells for integrated circuit manufacture SJ/T 10584-1994

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