GB/T 42263-2022 Active National standards

GB/T 42263-2022 Determination of nitrogen content in silicon single crystal—Secondary ion mass spectrometry method

Publish Date: 2022-12-30 Implement Date: 2023-04-01 For services related to genuine standard inquiry, procurement, translation, and other related services in China, please Contact Us

Basic Information

Standard Code: GB/T 42263-2022

Standard Type: National standards

Standard Status: Active

is_force_gb: no

CCS Name: Analysis methods for semi-metallic and semiconductor materials

ICS Name: \nMetal material testing

Publish Date: 2022-12-30

Implement Date: 2023-04-01

Publisher: 国家市场监督管理总局、国家标准化管理委员会

Technical Committee: 全国半导体设备和材料标准化技术委员会(SAC/TC 203)、全国半导体设备和材料标准化技术委员会材料分技术委员会(SAC/TC 203/SC 2)

Pages: 6 pages

Scope

本文件描述了硅单晶中氮含量的二次离子质谱测试方法。本文件适用于硼、锑、砷、磷的掺杂浓度小于1×1020 cm-3（0.2%）的硅单晶中氮含量的测定，测定范围不小于1×1014 cm-3。注：硅单晶中氮含量以每立方厘米中的原子数计。

Development Information

Drafting Units:

中国电子科技集团公司第四十六研究所、有色金属技术经济研究院有限责任公司

Drafting Persons:

马农农、何友琴、李素青、陈潇、刘立娜、何烜坤

Word Count: 14 Thousand words Pages: 6 pages

Referenced Standards

GB/T 14264-1993 Semiconductor materials—Terms and definitions GB/T 14264-2009 Semiconductor materials—Terms and definitions GB/T 14264-2024 Terminology of semiconductor materials GB/T 22461-2008 Surface chemical analysis—Vocabulary GB/T 22461.1-2023 Surface chemical analysis—Vocabulary—Part 1:General terms and terms used in spectroscopy GB/T 22461.2-2023 Surface chemical analysis—Vocabulary—Part 2:Terms used in scanning probe microscopy GB/T 32267-2015 Terminology of performance testing for analytical instrument GB/T 22461.3-2026 Surface chemical analysis—Vocabulary—Part 3:Terms used in optical interface analysis

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