T/CASAS 004.1-2018 Active Group standards

T/CASAS 004.1-2018 Defect terminology for 4H silicon carbide substrates and epitaxial layers

T/CASAS 004.1-2018 Defect terminology for 4H silicon carbide substrates and epitaxial layers

Publish Date: 2018-11-20 Implement Date: 2018-11-20 For services related to genuine standard inquiry, procurement, translation, and other related services in China, please Contact Us
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Basic Information

Standard Code: T/CASAS 004.1-2018
Standard Type: Group standards
Standard Status: Active
is_force_gb: no
CCS Name: \nTest methods for the physical and chemical properties of metals
ICS Name: Integrated Components of Semiconductor Devices
Publish Date: 2018-11-20
Implement Date: 2018-11-20

Scope

Main technical content: Due to the fact that the shapes, types, and causes of 4H-SiC defects, especially 4H-SiC epitaxial defects, differ from or are completely different from those of other common semiconductor defects due to the different epitaxial growth modes, and there are currently no applicable national standards or industry standards, this standard is specifically formulated to standardize the terminology and definitions of 4H-SiC defects

Development Information

Same series standard

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