PDF
YS/T 15-2015 Active
YS/T 15-2015 Test method for thickness of epitaxial layers and diffused layers by angle lap stain
Abstract
This standard specifies the angle-grinding staining method for measuring the thickness of silicon epitaxial layers and diffusion layers.
This standard is applicable to the measurement of the thickness of silicon epitaxial layers and diffusion layers where the epitaxial layer and diffusion layer have different conductivity types from the substrate, or where the resistivity of the two layers differs by at least one order of magnitude. The measurement range is 1 μm to 100 μm.
General Product Information
| Document Type | Industry standards-Non-ferrous metals |
|---|---|
| Standard Status | Active |
| Standard Code | YS/T 15-2015 |
| CCS | \nTest methods for the physical properties of metals |
| ICS | \nMetal material testing |
| Implement Date | 2015-10-01 |
Price
$ 29
Subtotal
$ 29
Tax
$ 0.00
Order Total (incl. tax)
$ 29