T/CPIA 0065-2024 Active
T/CPIA 0065-2024 Plasma enhanced chemical vapor deposition (PECVD) equipment used for Heterojunction solar cell fabrication
Abstract
This document specifies the terms and definitions, working environment, equipment requirements, test methods, inspection rules, and packaging, marking, handling, and transportation, storage, etc. of plasma-enhanced chemical vapor deposition (PECVD) equipment used in intrinsic film heterojunction batteries (hereinafter referred to as "PECVD equipment"). This document is applicable to PECVD equipment used in intrinsic film heterojunction batteries. The product is mainly used for depositing various film materials, such as amorphous silicon, microcrystalline silicon, silicon dioxide, silicon nitride films, and other intrinsic film materials.
General Product Information
| Document Type | Group standards |
|---|---|
| Standard Status | Active |
| Standard Code | T/CPIA 0065-2024 |
| ICS | Solar energy engineering |
| Implement Date | 2024-03-15 |