T/CPIA 0065-2024
Active
Group standards
T/CPIA 0065-2024 Plasma enhanced chemical vapor deposition (PECVD) equipment used for Heterojunction solar cell fabrication
T/CPIA 0065-2024 Plasma enhanced chemical vapor deposition (PECVD) equipment used for Heterojunction solar cell fabrication
Price:
$ 38.00
Basic Information
Standard Code:
T/CPIA 0065-2024
Standard Type:
Group standards
Standard Status:
Active
is_force_gb:
no
CCS Name:
-
ICS Name:
Solar energy engineering
Publish Date:
2024-03-10
Implement Date:
2024-03-15
Scope
This document specifies the terms and definitions, working environment, equipment requirements, test methods, inspection rules, and packaging, marking, handling, and transportation, storage, etc. of plasma-enhanced chemical vapor deposition (PECVD) equipment used in intrinsic film heterojunction batteries (hereinafter referred to as "PECVD equipment"). This document is applicable to PECVD equipment used in intrinsic film heterojunction batteries. The product is mainly used for depositing various film materials, such as amorphous silicon, microcrystalline silicon, silicon dioxide, silicon nitride films, and other intrinsic film materials.
Development Information
Related Standards
GB/T 6492-1986
Replaced
GB/T 6494-1986
Replaced
GB/T 6494-1986 Measurement procedures for electrical characteristics of astronautic solar cells
GB/T 6496-1986
Replaced
GB/T 6496-1986 The general rules of astronautic solar cell calibration
GB/T 6497-1986
Active
GB/T 6497-1986 The general rules of terrestrial solar cell calibration
GB/T 12632-1990
Abolished
GB/T 12632-1990 General specification of single silicon solar cells
GB/T 12915-1991
Abolished