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YS/T 14-2015 Active
YS/T 14-2015 Test method for thickness of heteroepitaxy layers and polycrystalline layers
Abstract
This standard specifies the measurement methods for the thickness of heteroepitaxial layers and silicon polycrystalline layers.
This standard is applicable to the measurement of the thickness of heteroepitaxial layers and silicon polycrystalline layers, where the interface layer between the substrate and the deposited layer is less than 100 nm. The thickness measurement range is 1 μm to 100 μm.
General Product Information
| Document Type | Industry standards-Non-ferrous metals |
|---|---|
| Standard Status | Active |
| Standard Code | YS/T 14-2015 |
| CCS | \nTest methods for the physical properties of metals |
| ICS | \nMetal material testing |
| Implement Date | 2015-10-01 |
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