T/CPIA 0059-2024 Active
T/CPIA 0059-2024 Low-pressure chemical vapor deposition equipment for crystalline silicon photovoltaic cells
Abstract
This document specifies the terms and definitions, working environment, technical requirements, basic performance, inspection methods, delivery inspection, and marking, packaging, handling, and transportation, storage of low-pressure chemical vapor deposition (LPCVD) equipment for crystalline silicon photovoltaic cells (hereinafter referred to as "LPCVD equipment"). This document is applicable to the production and inspection of tube-type LPCVD equipment for crystalline silicon photovoltaic cells. Other types of LPCVD equipment can be used for reference. LPCVD equipment can be used for the preparation of processes such as tunnel oxide layers, intrinsic polycrystalline silicon (Poly-Si) layers, and in-situ doped polycrystalline silicon (Poly-Si) layers.
General Product Information
| Document Type | Group standards |
|---|---|
| Standard Status | Active |
| Standard Code | T/CPIA 0059-2024 |
| ICS | Solar energy engineering |
| Implement Date | 2024-03-15 |