T/CPIA 0059-2024 Active Group standards

T/CPIA 0059-2024 Low-pressure chemical vapor deposition equipment for crystalline silicon photovoltaic cells

Publish Date: 2024-03-10 Implement Date: 2024-03-15 For services related to genuine standard inquiry, procurement, translation, and other related services in China, please Contact Us

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Basic Information

Standard Code: T/CPIA 0059-2024

Standard Type: Group standards

Standard Status: Active

is_force_gb: no

CCS Name: -

ICS Name: Solar energy engineering

Publish Date: 2024-03-10

Implement Date: 2024-03-15

Scope

This document specifies the terms and definitions, working environment, technical requirements, basic performance, inspection methods, delivery inspection, and marking, packaging, handling, and transportation, storage of low-pressure chemical vapor deposition (LPCVD) equipment for crystalline silicon photovoltaic cells (hereinafter referred to as "LPCVD equipment"). This document is applicable to the production and inspection of tube-type LPCVD equipment for crystalline silicon photovoltaic cells. Other types of LPCVD equipment can be used for reference. LPCVD equipment can be used for the preparation of processes such as tunnel oxide layers, intrinsic polycrystalline silicon (Poly-Si) layers, and in-situ doped polycrystalline silicon (Poly-Si) layers.