GB/T 3656-1983
Replaced
GB/T 32278-2015
Replaced
National standards
GB/T 32278-2015 Test method for flatness of monocrystalline silicon carbide wafers
GB/T 32278-2015 Test method for flatness of monocrystalline silicon carbide wafers
Basic Information
Standard Code:
GB/T 32278-2015
Standard Type:
National standards
Standard Status:
Replaced
is_force_gb:
no
CCS Name:
\nTest methods for the physical properties of metals
ICS Name:
\nMetal material testing
Publish Date:
2015-12-10
Implement Date:
2017-01-01
Pages:
8 pages
Scope
This standard specifies the flatness of silicon carbide single-crystal polished wafers, including the test methods for total thickness variation (TTV), local thickness variation (LTV), bow, and warp. This standard is applicable to the flatness testing of silicon carbide single-crystal polished wafers with diameters of 50.8 mm, 76.2 mm, and 100 mm, and thicknesses ranging from 0.13 mm to 1 mm.
Development Information
Superseded by the following standards
Referenced Standards
Related Standards
GB/T 3657-1983
Replaced
GB/T 3657-1983 Measurement method of direct magnetic properties of soft magnetic alloys
GB/T 3849-1983
Replaced
GB/T 3849-1983 Hardmetals—Rockwell hardness (scale A) test method
GB/T 3850-1983
Replaced
GB/T 3850-1983 Impermeable sintered metal materials and hardmetals—determination of density
GB/T 3851-1983
Replaced
GB/T 3851-1983 Hardmetals—determination of transverse rupture strength
GB/T 4326-1984
Replaced