GB/T 3143-1982
Active
GB/T 32495-2016
Active
National standards
GB/T 32495-2016 Surface chemical analysis—Secondary-ion mass spectrometry—Method for depth profiling of arsenic in silicon
GB/T 32495-2016 Surface chemical analysis—Secondary-ion mass spectrometry—Method for depth profiling of arsenic in silicon
Basic Information
Standard Code:
GB/T 32495-2016
Standard Type:
National standards
Standard Status:
Active
is_force_gb:
no
CCS Name:
Basic standards and general methods
ICS Name:
Chemical analysis
Publish Date:
2016-02-24
Implement Date:
2017-01-01
Pages:
14 pages
Scope
This standard details the method for conducting a depth analysis of arsenic in silicon using a sector magnetic field or a quadrupole secondary ion mass spectrometer, as well as the method for depth calibration using a stylus profiler or an optical interferometer. This standard is applicable to monocrystalline silicon, polycrystalline silicon, and amorphous silicon samples with an arsenic atomic concentration ranging from 1×1016 atoms/cm3 to 2.5×1021 atoms/cm3, and pit depths of 50 nm or greater.
Development Information
Referenced Standards
GB/T 20176-2006 Surface chemical analysis—Secondary-ion mass spectrometry—Determination of boron atomic concentration in silicon using uniformly doped materials
GB/T 25186-2010 Surface chemical analysis—Secondary-ion mass spectrometry—Determination of relative sensitivity factors from ion-implanted reference materials
ISO 18115-1
Adopt standards
ISO 12406:2010
Related Standards
GB/T 4472-1984
Replaced
GB/T 4472-1984 General rule for determination of density and relative density for chemical products
GB/T 4946-1985
Replaced
GB/T 4946-1985 Terms of gas chromatography
GB/T 5274-1985
Replaced
GB/T 5274-1985 Gas analysis—Preparation of calibration gas mixtures—Weighing methods
GB/T 5831-1986
Replaced
GB/T 5831-1986 Determination of trace oxygen in the gases—Colorimetric method
GB/T 5832.2-1986
Replaced