GB/T 3143-1982
Active
GB/T 20176-2025
Active
National standards
GB/T 20176-2025 Surface chemical analysis—Secondary-ion mass spectrometry—Determination of boron atomic concentration in silicon using uniformly doped materials
GB/T 20176-2025 Surface chemical analysis—Secondary-ion mass spectrometry—Determination of boron atomic concentration in silicon using uniformly doped materials
Price:
$ 50.00
Basic Information
Standard Code:
GB/T 20176-2025
Standard Type:
National standards
Standard Status:
Active
is_force_gb:
no
CCS Name:
Basic standards and general methods
ICS Name:
Chemical analysis
Publish Date:
2025-06-30
Implement Date:
2026-01-01
Pages:
24 pages
Scope
This document details the secondary ion mass spectrometry method for determining the atomic concentration of boron in single-crystal silicon using a calibrated uniformly doped material (calibrated with a reference material injected with boron). It is suitable for uniformly doped boron concentrations ranging from 1×1016 atoms/cm3 to 1×1020 atoms/cm3.
Development Information
Replace the following standards
Referenced Standards
ISO 5725-2
ISO 17560
ISO 18114
Adopt standards
ISO 14237:2010
Related Standards
GB/T 4472-1984
Replaced
GB/T 4472-1984 General rule for determination of density and relative density for chemical products
GB/T 4946-1985
Replaced
GB/T 4946-1985 Terms of gas chromatography
GB/T 5274-1985
Replaced
GB/T 5274-1985 Gas analysis—Preparation of calibration gas mixtures—Weighing methods
GB/T 5831-1986
Replaced
GB/T 5831-1986 Determination of trace oxygen in the gases—Colorimetric method
GB/T 5832.2-1986
Replaced