T/CPIA 0065-2024 Active Group standards

T/CPIA 0065-2024 Plasma enhanced chemical vapor deposition (PECVD) equipment used for Heterojunction solar cell fabrication

T/CPIA 0065-2024 Plasma enhanced chemical vapor deposition (PECVD) equipment used for Heterojunction solar cell fabrication

Publish Date: 2024-03-10 Implement Date: 2024-03-15 For services related to genuine standard inquiry, procurement, translation, and other related services in China, please Contact Us
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Basic Information

Standard Code: T/CPIA 0065-2024
Standard Type: Group standards
Standard Status: Active
is_force_gb: no
CCS Name: -
ICS Name: Solar energy engineering
Publish Date: 2024-03-10
Implement Date: 2024-03-15

Scope

This document specifies the terms and definitions, working environment, equipment requirements, test methods, inspection rules, and packaging, marking, handling, and transportation, storage, etc. of plasma-enhanced chemical vapor deposition (PECVD) equipment used in intrinsic film heterojunction batteries (hereinafter referred to as "PECVD equipment"). This document is applicable to PECVD equipment used in intrinsic film heterojunction batteries. The product is mainly used for depositing various film materials, such as amorphous silicon, microcrystalline silicon, silicon dioxide, silicon nitride films, and other intrinsic film materials.

Development Information

Word Count: 21 Thousand words

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