GB/T 46717-2025 Active National standards

GB/T 46717-2025 Semiconductor devices—Metallization stress void test

GB/T 46717-2025 Semiconductor devices—Metallization stress void test

Publish Date: 2025-10-31 Implement Date: 2026-05-01 For services related to genuine standard inquiry, procurement, translation, and other related services in China, please Contact Us
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Basic Information

Standard Code: GB/T 46717-2025
Standard Type: National standards
Standard Status: Active
is_force_gb: no
CCS Name: Semiconductor discrete devices
ICS Name: Integrated Components of Semiconductor Devices
Publish Date: 2025-10-31
Implement Date: 2026-05-01
Pages: 20 pages

Scope

This document describes the stress testing method and related criteria for metallized voids in aluminum (Al) or copper (Cu).
This document is applicable to the reliability research and evaluation of semiconductor processes.

Development Information

Word Count: 23 Thousand words Pages: 20 pages

Adopt standards

IEC 62418:2010

Related Standards

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