T/SOECC 021-2025 Active Group standards

T/SOECC 021-2025 Performance Test Method for Color Photopolymers Used in LCD Display Color Filters

T/SOECC 021-2025 Test method for color photoresist performance for LCD display color film

Publish Date: 2025-04-25 Implement Date: 2025-04-27 For services related to genuine standard inquiry, procurement, translation, and other related services in China, please Contact Us

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Basic Information

Standard Code: T/SOECC 021-2025

Standard Type: Group standards

Standard Status: Active

is_force_gb: no

CCS Name: -

ICS Name: Semiconductor materials

Publish Date: 2025-04-25

Implement Date: 2025-04-27

Scope

Main Technical Content: The content of the following documents constitutes essential provisions of this document through normative references in the text. Among them, the referenced documents with a specified date apply only to the version corresponding to that date; the referenced documents without a specified date apply to the latest version (including all amendment sheets) of those documents. GB/T 13173-2021 Surface Active Agents and Detergents - Test Methods GB/T 15357-2014 Surface Active Agents and Detergents - Determination of Viscosity and Flow Properties of Liquid Products by Rotational Viscometer GB/T 25915.1-2021 Cleanrooms and Related Controlled Environments - Part 1: Air Cleanliness Classification by Particle Concentration GB/T 43793.1-2024 Test Methods for Color Photoresist Used in Flat Panel Displays - Part 1: Physical and Chemical Properties 3 Terms and Definitions The following terms and definitions apply to this document. 3.1 Line Width The critical dimension (CD) of a pattern formed during the lithography process. 4 Test Environment Requirements 4.1 Cleanliness Requirements - Film production stage (cleanliness not lower than ISO Class 7 as specified in GB/T 25915.1-2021). - Test stage (cleanliness not lower than ISO Class 6 as specified in GB/T 25915.1-2021). 4.2 Environmental Conditions Unless otherwise specified, the test shall be conducted under the following conditions: a) Environmental temperature: 23 °C ± 2 °C; b) Relative humidity: 30% ~ 70%; c) Atmospheric pressure: 86 kPa ~ 106 kPa. 4.3 Temperature Conditioning of Samples After removing the samples, they shall be placed in a normal temperature environment for 15 minutes. 4.4 Storage Requirements The storage requirements for photoresist are as follows: a) Environmental temperature: 5 °C ± 5 °C; b) Relative humidity: 30% ~ 70%. The storage requirements for photoresist samples (before film formation) are as follows: a) Environmental tempe