GB/T 11093-1989
Replaced
GB/T 29849-2013
Active
National standards
GB/T 29849-2013 Test method for measuring surface metallic contamination of silicon materials used for photovoltaic applications by inductively coupled plasma mass spectrometry
GB/T 29849-2013 Test method for measuring surface metallic contamination of silicon materials used for photovoltaic applications by inductively coupled plasma mass spectrometry
Basic Information
Standard Code:
GB/T 29849-2013
Standard Type:
National standards
Standard Status:
Active
is_force_gb:
no
CCS Name:
Element semiconductor materials
ICS Name:
Semiconductor materials
Publish Date:
2013-11-12
Implement Date:
2014-04-15
Pages:
8 pages
Scope
This standard specifies the method for determining the content of trace metal impurities on the surface of silicon materials used in photovoltaic cells by using an inductively coupled plasma mass spectrometer (ICPMS).
This standard is applicable to the determination of the content of trace metal impurities such as sodium, magnesium, aluminum, potassium, calcium, titanium, chromium, iron, nickel, copper, and zinc on the surface of silicon materials used in photovoltaic cells. The measurement ranges of each element are shown in Table 1.
Development Information
Referenced Standards
Related Standards
GB/T 13388-1992
Replaced
GB/T 13388-1992 Method for measuring crystallographic orientation of flats on single crystal silicon slices and wafers by X-ray techniques
GB/T 13389-1992
Replaced
GB/T 13389-1992 Practice for conversion between resistivity and dopant density for boron-doped and phosphorus-doped silicon
GB/T 13843-1992
Abolished
GB/T 13843-1992 Polished monocrystalline sapphire substrates
GB/T 14015-1992
Active
GB/T 14015-1992 Silicon on sapphire epitaxial wafers
GB/T 14139-1993
Replaced