GB/T 14140.1-1993
Replaced
T/CNIA 0017-2019
Active
Group standards
T/CNIA 0017-2019 Determination of Impurity Content in Polysilicon Using Chlorosilane by Inductively Coupled Plasma Mass Spectrometry (ICP-MS)
T/CNIA 0017-2019 Determination of Impurity Content in Polysilicon Using Chlorosilane by Inductively Coupled Plasma Mass Spectrometry (ICP-MS)
Price:
$ 20.00
Basic Information
Standard Code:
T/CNIA 0017-2019
Standard Type:
Group standards
Standard Status:
Active
is_force_gb:
no
CCS Name:
Analysis methods for semi-metallic and semiconductor materials
ICS Name:
Comprehensive Testing of Metal Materials
Publish Date:
2019-02-13
Implement Date:
2019-06-01
Scope
Main technical content: This standard specifies the inductively coupled plasma mass spectrometry method for determining the impurity content (boron, phosphorus, iron, calcium, aluminum, chromium, nickel, copper, zinc, titanium, potassium, and sodium) in chlorosilane used for polysilicon. This standard is applicable to the determination of the impurity content (boron, phosphorus, iron, calcium, aluminum, chromium, nickel, copper, zinc, titanium, potassium, and sodium) in chlorosilane used for polysilicon, with a measurement range of 0μg/L to 1000μg/L.
Development Information
Related Standards
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GB/T 14140.2-1993 Silicon slices and wafers—Measuring of diameter—Micrometer method
GB/T 15615-1995
Abolished
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GB/T 16481-1996
Abolished
GB/T 16481-1996 Standard spectrum tables of microwave plasma torch-atomic emitting spectrum of rare earth
GB/T 1550-1997
Replaced
GB/T 1550-1997 Standard methods for measuring conductivity type of extrinsic semiconducting materials
GB/T 1553-1997
Replaced