GB/T 29505-2013 Active National standards

GB/T 29505-2013 Test method for measuring surface roughness on planar surfaces of silicon wafer

Publish Date: 2013-05-09 Implement Date: 2014-02-01 For services related to genuine standard inquiry, procurement, translation, and other related services in China, please Contact Us

Basic Information

Standard Code: GB/T 29505-2013

Standard Type: National standards

Standard Status: Active

is_force_gb: no

CCS Name: Semi-metals and semiconductor materials

ICS Name: Semiconductor materials

Publish Date: 2013-05-09

Implement Date: 2014-02-01

Pages: 28 pages

Scope

This standard provides the measurement principles, measurement equipment, and procedures for three common methods of measuring the surface roughness of silicon wafers: profilometers, interferometers, and scatterometers. It also specifies the standard scanning position diagrams and roughness abbreviation definitions for local or entire areas of the silicon wafer surface.
This standard is applicable to the measurement of the roughness of flat silicon wafers; it can also be used for other types of flat wafer materials, but it is not suitable for measuring the roughness of the edge areas of wafers.
This standard is not applicable to measurement instruments with a bandwidth spatial wavelength of ≤10 nm.