GB/T 37049-2018 Active National standards

GB/T 37049-2018 Test method for the content of metal impurity in electronic grade polysilicon—Inductively coupled-plasma mass spectrometry method

Publish Date: 2018-12-28 Implement Date: 2019-04-01 For services related to genuine standard inquiry, procurement, translation, and other related services in China, please Contact Us

Basic Information

Standard Code: GB/T 37049-2018

Standard Type: National standards

Standard Status: Active

is_force_gb: no

CCS Name: Analysis methods for semi-metallic and semiconductor materials

ICS Name: Chemical analysis of metal materials

Publish Date: 2018-12-28

Implement Date: 2019-04-01

Pages: 7 pages

Scope

This standard specifies the method for determining the content of trace base metal impurities in electronic-grade polysilicon using inductively coupled plasma mass spectrometers (ICP-MS).
This standard is applicable to the determination of iron, chromium, nickel, copper, zinc, and sodium in a base metal impurity range of less than 5 ng/g in GB/T 12963.

Development Information

Word Count: 11 Thousand words Pages: 7 pages

Referenced Standards

GB/T 25915.1-2010 Cleanrooms and associated controlled environments—Part 1:Classification of air cleanliness SEMI C1 SEMI F63 GB/T 12963-1996 Polycrystalline silicon GB/T 12963-2009 Specification for polycrystalline silicon GB/T 12963-2014 Electronic-grade polycrystalline silicon GB/T 12963-2022 Electronic-grade polycrystalline silicon GB/T 14264-1993 Semiconductor materials—Terms and definitions GB/T 14264-2009 Semiconductor materials—Terms and definitions GB/T 14264-2024 Terminology of semiconductor materials JJF 1159-2006 Calibration Specification for Quadrupole Inductively Coupled Plasma Mass Spectrometers

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