T/ICMTIA 5.3-2020 Active Group standards

T/ICMTIA 5.3-2020 The method of inspecting ArF photoresist used in integrated circuits using optical lithography

T/ICMTIA 5.3-2020 The method of inspecting ArF photoresist used in integrated circuits using optical lithography

Publish Date: 2020-12-31 Implement Date: 2021-03-01 For services related to genuine standard inquiry, procurement, translation, and other related services in China, please Contact Us
Price: $ 38.00
Out of stock

Basic Information

Standard Code: T/ICMTIA 5.3-2020
Standard Type: Group standards
Standard Status: Active
is_force_gb: no
CCS Name: High-purity reagents and high-purity substances
ICS Name: Semiconductor materials
Publish Date: 2020-12-31
Implement Date: 2021-03-01

Scope

Scope: This document is applicable to ArF photoresists for integrated circuits; Main technical content: This document specifies the requirements and methods for photoresistance testing of ArF photoresists, as well as testing standards and requirements for packaging, transportation, storage, and environmental protection.

Development Information

Same series standard

Related Standards

Contact Us