SJ/T 11829.1-2022 Active Industry standards-Electronics

SJ/T 11829.1-2022 SJ/T 11829.1-2022 Plasma-enhanced chemical vapor deposition (PECVD) equipment for crystalline silicon photovoltaic cells - Part 1: Tubular PECVD equipment

Publish Date: 2022-10-20 Implement Date: 2023-01-01 For services related to genuine standard inquiry, procurement, translation, and other related services in China, please Contact Us

Basic Information

Standard Code: SJ/T 11829.1-2022

Standard Type: Industry standards

Standard Status: Active

is_force_gb: no

CCS Name: Electronic industry production equipment

ICS Name: Electronic product production equipment

Publish Date: 2022-10-20

Implement Date: 2023-01-01

Development Information

Same series standard

SJ/T 11829.2-2022 Plasma-enhanced chemical vapor deposition (PECVD) equipment for crystalline silicon photovoltaic cells - Part 2: Platen PECVD equipment

Related Standards

GB/T 15861-2012 Active

GB/T 15861-2012 General specification of ion beam etching system

Publish Date: 2012-11-05

GB/T 15862-2012 Active

GB/T 15862-2012 General specification of ion implantation equipment

Publish Date: 2012-11-05

GB/T 29845-2013 Active

GB/T 29845-2013 Guide for final assembly,packaging,transportation, unpacking,and relocation of semiconductor manufacturing equipment

Publish Date: 2013-11-12

GB/T 30116-2013 Active

GB/T 30116-2013 Requirements for semiconductor manufacturing facility electromagnetic compatibility

Publish Date: 2013-12-17

GB/T 37466-2019 Active

GB/T 37466-2019 Laser lift-off equipment used for GaN

Publish Date: 2019-06-04

DB44/T 1668-2015 Abolished

DB44/T 1668-2015 Li-ion battery continuous welding machine

Publish Date: 2015-09-07