YS/T 1024-2015 Active Industry standards-Non-ferrous metals

YS/T 1024-2015 Tantalum sputtering targets

YS/T 1024-2015 Tantalum sputtering targets

Publish Date: 2015-04-30 Implement Date: 2015-10-01 For services related to genuine standard inquiry, procurement, translation, and other related services in China, please Contact Us

Basic Information

Standard Code: YS/T 1024-2015

Standard Type: Industry standards

Standard Status: Active

is_force_gb: no

CCS Name: Rare high-melting-point metals and their alloys

ICS Name: Other non-ferrous metal products

Publish Date: 2015-04-30

Implement Date: 2015-10-01

Pages: 9 pages

Scope

This standard specifies the requirements, test methods, inspection rules, and marking, packaging, transportation, storage, quality certificates, and order forms (or contracts) for tantalum targets used in sputtering for the preparation of thin films.
This standard applies to tantalum targets used in sputtering, which are manufactured from high-purity tantalum ingots through vacuum electron beam melting and processed by plastic forming, heat treatment, machining, welding, and other methods (hereinafter referred to as tantalum targets).

Development Information

Word Count: 16 Thousand words Pages: 9 pages

Referenced Standards

GB/T 20967-2007 Non-destructive testing—Visual testing—General principles GB/T 1804-2000 General tolerances for linear and angular dimensions without individual tolerance indications GB/T 4340.1-1999 Metallic materials—Vickers hardness test—Part 1:Test method GB/T 4340.1-2009 Metallic materials—Vickers hardness test—Part 1:Test method GB/T 4340.1-2024 Metallic materials—Vickers hardness test—Part 1:Test method GB/T 6394-2002 Metal-methods for estimating the average grain size GB/T 6394-2017 Determination of estimating the average grain size of metal GB/T 8651-2002 Metal plates—Flaw detection method by the ultrasonic plate wave GB/T 8651-2015 Flaw detection method by the ultrasonic plate wave for metal plates GB/T 15076.8-1994 Methods for chemical analysis of tantalum and niobium—Determination of sulphur content in niobium GB/T 15076.8-2008 Methods for chemical analysis of tantalum and niobium—Determination of carbon and sulphur contents GB/T 15076.13-1994 Methods for chemical analysis of tantalum and niobium—Determination of nitrogen content in tantalum GB/T 15076.13-2017 Methods for chemical analysis of tantalum and niobium—Part 13:Determination of nitrogen content—Inert gas fusion thermal conductivity method GB/T 15076.14-1994 Methods for chemical analysis of tantalum and niobium—Determination of oxygen content GB/T 15076.14-2008 Methods for chemical analysis of tantalum and niobium—Determination of oxygen content GB/T 15076.15-1994 Methods for chemical analysis of tantalum and niobium—Determination of hydrogen content GB/T 15076.15-2008 Methods for chemical analysis of tantalum and niobium—Determination of hydrogen content YS/T 837-2012 Standard practice for ultrasonic C-scan bond evaluation of sputtering target-backing plate assemblies YS/T 899-2013 Methods for chemical analysis of high purity tantalum—Determination of trace impurity element content—Glow discharge mass spectrometry YS/T 899-2024 YS/T 899-2024 Determination of trace element content in high purity tantalum by glow discharge mass spectrometry method

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