GB/T 11093-1989
Replaced
T/CASME 581-2023
Active
Group standards
T/CASME 581-2023 Technical requirements for silicon ring used in semiconductors
T/CASME 581-2023 Technical requirements for silicon ring used in semiconductors
Price:
$ 20.00
Basic Information
Standard Code:
T/CASME 581-2023
Standard Type:
Group standards
Standard Status:
Active
is_force_gb:
no
CCS Name:
Metallurgy
ICS Name:
Semiconductor materials
Publish Date:
2023-07-28
Implement Date:
2023-08-01
Scope
Scope: This document is applicable to dry etching processes with a process node of less than 28 nm (including 28 nm) for 8-inch to 12-inch wafers. Main technical content: This document specifies the terms and definitions of silicon rings for semiconductors, their production and processing, requirements, test methods, inspection rules, as well as aspects related to marking, packaging, storage, and transportation.
Development Information
Related Standards
GB/T 13388-1992
Replaced
GB/T 13388-1992 Method for measuring crystallographic orientation of flats on single crystal silicon slices and wafers by X-ray techniques
GB/T 13389-1992
Replaced
GB/T 13389-1992 Practice for conversion between resistivity and dopant density for boron-doped and phosphorus-doped silicon
GB/T 13843-1992
Abolished
GB/T 13843-1992 Polished monocrystalline sapphire substrates
GB/T 14015-1992
Active
GB/T 14015-1992 Silicon on sapphire epitaxial wafers
GB/T 14139-1993
Replaced