T/CSTM 01199-2024 Active Group standards

T/CSTM 01199-2024 Multi-layer metal thin film layer structure measurement and analysis method X-ray photoelectron spectroscopy (XPS)

Publish Date: 2024-01-05 Implement Date: 2024-04-05 For services related to genuine standard inquiry, procurement, translation, and other related services in China, please Contact Us

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Basic Information

Standard Code: T/CSTM 01199-2024

Standard Type: Group standards

Standard Status: Active

is_force_gb: no

CCS Name: Semi-metals and semiconductor materials

ICS Name: Semiconductor materials

Publish Date: 2024-01-05

Implement Date: 2024-04-05

Scope

Scope: This document specifies the analytical method for depth profiling of multi-layered metal films using X-ray photoelectron spectroscopy (XPS). This document is applicable to the characterization of the composition, chemical state, and film thickness of nano-scale multi-layered metal films within a depth range of 70 nm to 240 nm. Main technical content: This document specifies the analytical method for depth profiling of multi-layered metal films using X-ray photoelectron spectroscopy (XPS). This document is applicable to the characterization of the composition, chemical state, and film thickness of nano-scale multi-layered metal films within a depth range of 70 nm to 240 nm.