GB/T 11093-1989
Replaced
GB/T 6624-2009
Active
National standards
GB/T 6624-2009 Standard method for measuring the surface quality of polished silicon slices by visual inspection
GB/T 6624-2009 Standard method for measuring the surface quality of polished silicon slices by visual inspection
Basic Information
Standard Code:
GB/T 6624-2009
Standard Type:
National standards
Standard Status:
Active
is_force_gb:
no
CCS Name:
Semi-metals and semiconductor materials
ICS Name:
Semiconductor materials
Publish Date:
2009-10-30
Implement Date:
2010-06-01
Pages:
4 pages
Scope
This standard specifies a method for visually inspecting the surface quality of monocrystalline polished wafers (hereinafter referred to as polished wafers) under certain lighting conditions.
This standard is applicable to the surface quality inspection of silicon polished wafers. The visual inspection of the surface quality of epitaxial wafers can also refer to this method for reference.
Development Information
Replace the following standards
Referenced Standards
Related Standards
GB/T 13388-1992
Replaced
GB/T 13388-1992 Method for measuring crystallographic orientation of flats on single crystal silicon slices and wafers by X-ray techniques
GB/T 13389-1992
Replaced
GB/T 13389-1992 Practice for conversion between resistivity and dopant density for boron-doped and phosphorus-doped silicon
GB/T 13843-1992
Abolished
GB/T 13843-1992 Polished monocrystalline sapphire substrates
GB/T 14015-1992
Active
GB/T 14015-1992 Silicon on sapphire epitaxial wafers
GB/T 14139-1993
Replaced