T/ICMTIA 4.1-2020 Active Group standards

T/ICMTIA 4.1-2020 The monomer for fluorinated argon resist used in integrated circuits, Part 1: Liquid methacrylate derivatives

T/ICMTIA 4.1-2020 The monomer for fluorinated argon resist used in integrated circuits, Part 1: Liquid methacrylate derivatives

Publish Date: 2020-12-31 Implement Date: 2021-03-01 For services related to genuine standard inquiry, procurement, translation, and other related services in China, please Contact Us
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Basic Information

Standard Code: T/ICMTIA 4.1-2020
Standard Type: Group standards
Standard Status: Active
is_force_gb: no
CCS Name: Synthetic materials
ICS Name: Semiconductor materials
Publish Date: 2020-12-31
Implement Date: 2021-03-01

Scope

Scope: This document is applicable to monomers synthesized from organic raw materials, solvents, suitable polymerization inhibitors, and other components, which can be used for the preparation of fluorinated argon resins after refining; Main technical content: This document specifies the terms and definitions of fluorinated argon photoresist monomers for integrated circuits, Part 1: Liquid methacrylate esters, product types and structural characteristics, technical requirements, analysis and detection methods, process requirements, packaging, storage, and transportation requirements, etc.

Development Information

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