GB/T 3656-1983
Replaced
GB/T 47080-2026
Active
National standards
GB/T 47080-2026 Test method for dislocation density of diamond single crystal polished wafer
GB/T 47080-2026 Test method for dislocation density of diamond single crystal polished wafer
Price:
$ 33.00
Basic Information
Standard Code:
GB/T 47080-2026
Standard Type:
National standards
Standard Status:
Active
is_force_gb:
no
CCS Name:
Analysis methods for semi-metallic and semiconductor materials
ICS Name:
\nMetal material testing
Publish Date:
2026-01-28
Implement Date:
2026-08-01
Pages:
12 pages
Scope
This document describes a method for measuring the dislocation density of cubic diamond single-crystal polishing wafers using dry etching combined with microscopic counting tests.
This document is suitable for testing the dislocation density of cubic diamond single-crystal polishing wafers with {100}, {110}, or {111 } crystal faces, with a range of 5×10^3 dislocations/cm2 to 5×10^7 dislocations/cm2.
Development Information
Referenced Standards
GB/T 678-2002 Chemical reagent—Ethanol
GB/T 678-2023 Chemical reagent—Ethanol
GB/T 686-1989 Chemical reagent—Acetone
GB/T 686-2008 Chemical reagent—Acetone
GB/T 686-2023 Chemical reagent—Acetone
GB/T 1555-1997 Test methods for determining the orientation of a semiconductor single crystal
GB/T 1555-2009 Testing methods for determining the orientation of a semiconductor single crystal
GB/T 1555-2023 Test methods for determining the orientation of a semiconductive single crystal
GB/T 3634.2-2011 Hydrogen—Part 2:Pure hydrogen,high pure hydrogen and ultrapure hydrogen
GB/T 3634.2-2025 Hydrogen—Part 2:Pure hydrogen,high purity hydrogen and ultra purity hydrogen
GB/T 6682-1992 Water for analytical laboratory use—Specification and test methods
GB/T 6682-2008 Water for analytical laboratory use—Specification and test methods
GB/T 8979-1996 Pure nitrogen
GB/T 8979-2008 Pure nitrogen and high purity nitrogen and ultra pure nitrogen
GB/T 8979-2025 Pure nitrogen,high purity nitrogen and ultra pure nitrogen
GB/T 14264-1993 Semiconductor materials—Terms and definitions
GB/T 14264-2009 Semiconductor materials—Terms and definitions
GB/T 14264-2024 Terminology of semiconductor materials
GB/T 14599-1993 High purity oxygen
GB/T 14599-2008 Pure oxygen and high purity oxygen and ultra pure oxygen
GB/T 14599-2025 Pure oxygen,high purity oxygen and ultra pure oxygen
Related Standards
GB/T 3657-1983
Replaced
GB/T 3657-1983 Measurement method of direct magnetic properties of soft magnetic alloys
GB/T 3849-1983
Replaced
GB/T 3849-1983 Hardmetals—Rockwell hardness (scale A) test method
GB/T 3850-1983
Replaced
GB/T 3850-1983 Impermeable sintered metal materials and hardmetals—determination of density
GB/T 3851-1983
Replaced
GB/T 3851-1983 Hardmetals—determination of transverse rupture strength
GB/T 4326-1984
Replaced